When a slightly defective rutile TiO2(110) surface is exposed to O2 at elevated temperatures, the molecule dissociates at defects, filling O vacancies (VO) and creating O adatoms (Oad) on Ti5c rows. The adsorption of molecular O2 at low temperatures has remained controversial. Low-temperature scanning tunneling microscopy of O2, dosed on TiO2(110) at a sample temperature of ≈100 K and imaged at 17 K, shows a molecular precursor at Ov as a faint change in contrast. The adsorbed O2 easily dissociates during the STM measurements, and the formation of Oad's at both sides of the original VO is observed.
Full text (PDF)
Users with online access to Phys. Rev. Lett can also access the article at the publisher.
The preprint is still available at ArXiv.org.
Information on this page is maintained by: Michael Schmid (schmid).