Structure of a thin oxide film on Rh(100)

J. Gustafson1, A. Mikkelsen1, M. Borg1, J.N. Andersen1, E. Lundgren1, C. Klein2, W. Hofer2, M. Schmid2, P. Varga2, L. Köhler3, G. Kresse3, N. Kasper4, A. Stierle4, H. Dosch4

1 Department of Synchrotron Radiation Research, Institute of Physics, Lund University, 22100 Lund, Sweden
2 Institut für Allgemeine Physik, Technische Universität Wien, 1040 Wien, Austria
3 Institut f. Materialphysik, Universität Wien, 1090 Wien, Austria
4 Max-Planck Institut f. Metallforschung, 70569 Stuttgart, Germany

Phys. Rev. B 71 (2005) 115442

The initial oxidation of Rh(100) has been studied using high resolution core level spectroscopy, low energy electron diffraction, surface x-ray diffraction, scanning tunneling microscopy and density functional theory. We report on a new oxygen induced structure displaying a c(8 × 2) periodicity at an oxygen pressure above 10-5 mbar and using a sample temperature of 700 K. Our experimental and theoretical data demonstrate that this structure is due to the formation of a thin surface oxide with a hexagonal trilayer O-Rh-O structure.

Corresponding author: J. Gustafson. Reprints also available from M. Schmid (schmid< encoded email address >).

Users with online access to Phys. Rev. B. can load the article from the publisher.