Potential sputtering of lithium fluoride by slow multicharged ions

T. Neidhart, F. Pichler, F. Aumayr, HP. Winter, M. Schmid and P. Varga

Institut für Allgemeine Physik, Technische Universität Wien, A-1040 Wien, Austria

Phys. Rev. Lett. 74 (1995) 5280-5283

Thin polycrystalline LiF films have been bombarded by slow (<= 1 keV) multicharged Arq+ ions (q<=9), in order to study the resulting total sputter yields by means of a quartz crystal microbalance. More than 99% of sputtered particles are neutral and show yields, at given impact energy, in proportion to the potential energy of projectile ions. The respective "potential sputtering" process takes already place far below 100 eV impact energy. It can be related to defect production in LiF following electron capture by the multicharged ions, and removes about one LiF molecule per 100 eV of projectile potential energy.

Corresponding author: P. Varga (varga< encoded email address >).

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